Response of Stomatal Resistance, Leaf Temperature and Transpiration Rate to Different Nitrogen Levels and Plant Growth Regulators of Banana  

C. Tamilselvi , U. Bangarusamy
Krishi Vigyan Kendra, Tamil Nadu Agricultural University, Tindivanam, Villupuram district
Author    Correspondence author
Plant Gene and Trait, 2014, Vol. 5, No. 3   doi: 10.5376/pgt.2014.05.0003
Received: 13 Jan., 2014    Accepted: 21 Jan., 2014    Published: 24 Jan., 2014
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Preferred citation for this article:

Tamilselvi and Bangarusamy, 2014, Response of Stomatal Resistance, Leaf Temperature and Transpiration Rate to Different Nitrogen Levels and Plant Growth Regulators of Banan, Plant Gene and Trait, Vol.5, No.3 22-26 (doi: 10.5376/pgt.2014.05.0003)

Abstract

Studies were carried out to understand the effects of certain plant growth regulators under different nitrogen levels on different gas exchanging parameters viz., stomatal resistance, leaf temperature and transpiration rate.  Different levels of nitrogen viz., 150 g N plant-1 (45 g+75 g+30 g N plant-1 at 3MAP, 5MAP and 7 MAP, respectively), M1+Urea 2% foliar spray, 200 g N plant-1 (60 g+100 g+40 g N plant-1 at 3 MAP, 5 MAP and 7 MAP respectively), M3+Urea 2% foliar spray and foliar spray of salicylic acid 100 ppm, mepiquat chloride 500 ppm, chlormequat chloride 1000 ppm, nitrobenzene 50 ppm, benzyl adenine 20 ppm and 25 ppm of 2,4-D at 3rd , 5th and 7th month after planting were given and compared with untreated control. Salicylic acid treated leaves showed high stomatal resistance with low transpiration.

Keywords
Banana; Growth regulators; Stomatal diffusive resistance; Leaf temperature; Transpiration rate and yield
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